Hydrogenated microcrystalline silicon thin film has been grown on silicon wafer and 7059 corning glass substrates by using hot wire pecvd method. Electrical, optical, and structural properties are charecterized by determining the conductivity, optical bandgap, X-ray Diffraction, and scanning electron microscopy of the grown films. This work was supported by the DCRG URGE project under contract No: 032/DCRG/URGE/2000 Tadulako University and accepted for publication at Physics Journal "Gravitasi, Wahana Interaksi Ilmiah" Departement of Physics Tadulako University July-December 2003.
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